Deposition Mechanism Based on Plasma Spray-Physical Vapor Deposition
نویسندگان
چکیده
منابع مشابه
Helicon plasma source for ionized physical vapor deposition
A helicon antenna that sits remotely outside the vacuum system is attached to a magnetron sputtering system. This increases the electron temperature, which increases the ionization of the sputter flux for achieving ionized physical vapor deposition (IPVD). There are no shadowing and contamination problems, unlike other IPVD devices with immersed coils, since the helicon antenna is outside the v...
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ژورنال
عنوان ژورنال: Journal of Inorganic Materials
سال: 2017
ISSN: 1000-324X
DOI: 10.15541/jim20170072